AGC ELECTRONICS TAIWAN INC

The synthetic fused silica glass AQ series is a high-purity, high-quality functional material based on AGCʼs abundant experience accumulated over its long history of technological R&D in fine glasses, fine chemicals, and fine ceramics.
AGC’s Synthetic Fused Silica AQ series is manufactured by the VAD method. The VAD method can reduce Si-OH content, providing customers with synthetic fused silica with the following features.

Features
Applications
Technical

High transmittance for deep ultraviolet rays with frequencies < 200 nm ranging from the i-ray to KrF, ArF, or Xe excimer lamps, and even for near infrared rays
Excellent Compaction/Rarefaction and Polarization Induced Birefringence(PIB) characteristics
Resistant to heat processing around 1000°C
Excellent durability against high-energy laser beams
Thermal expansion as low as 1/10 that of conventional glass
High uniformity
Very high purity, very low metal impurity content
Low OH group content
Outstanding chemical resistance
Low dielectric loss

Lens material for Semiconductor lithography system
Lens material for FPD lithography equipment
Photo mask substrate
Other optical materials
Glass wafer

Chemical constitution	SiO2	wt(%)	100
Thermal properties	CTE	ppm/K (50 to 200℃)	0.6
	Softening Point	℃	1600
	Annealing Point	℃	1120
	Strain Point	℃	1060
Optical properties	Refractive Index	nD	1.46
Chemical	Acid Resistance	mg/cm2	0.000
Chemical properties	Alkali Resi	mg/cm2	0.032
Mechanical properties	Density	g/cm3	2.20
	Young’s Modulus	GPa	74
	Knoop Microhardness	kg/mm2	540
Electrical properties	Bulk Resistivity	log(Ω･cm) at 200℃	12.5
Electrical properties	Dielectric Constant	at 1MH,R.T.	4.0

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Product catalogue:

AQ: AQ2: AQ3: AQT:

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